Among the applications for GAA chips, the VeritySEM 10 is being used to measure and characterize the selective epitaxy process which is key to transistor performance.
For 3D NAND memories, the system provides a large field of view and high depth of focus to measure entire staircase interconnect structures and help tune etch process recipes.
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Among the applications for GAA chips, the VeritySEM 10 is being used to measure and characterize the selective epitaxy process which is key to transistor performance.
For 3D NAND memories, the system provides a large field of view and high depth of focus to measure entire staircase interconnect structures and help tune etch process recipes.
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